PHI Genesis XPS (X‑ray Photoelectron Spectroscopy) System
We are excited to announce that the new PHI Genesis XPS (X‑ray Photoelectron Spectroscopy) system is now available for user access at Nano3.
This fully automated, multi‑technique scanning XPS/HAXPES system brings cutting‑edge surface analysis capabilities to our user community.
Some of its key features include:
- Dual monochromated X‑ray sources (Al and Cr) for greater analytical flexibility and deeper information depth
- High‑resolution microprobe (<5 µm for Al and <14 µm for Cr sources)
- Depth profiling with multiple ion gun options (monatomic Argon, Argon
cluster) - Fast automated switching between XPS and HAXPES modes
- Ultraviolet Photoelectron Spectroscopy (UP
S) - LowEnergy Inverse Photoelectron Spectroscopy (LEIPS)
- Reflection Electron Energy Loss Spectroscopy (REELS)
- Auger Electron Spectroscopy (AES)
- Hot/cold stage with a temperature range of -100 °C to 500 °C
- XPS on air-sensitive samples
We’re also pleased to introduce Dr. Fabian Martinez, who has recently joined the Nano3 team and will serve as the staff contact for the PHI Genesis XPS. Fabian brings extensive experience and looks forward to supporting users in utilizing this new system to its full potential.
We invite all users to explore the capabilities of this new advanced system. Please submit your training request on the PHI Genesis Scanning XPS via FOM. Look forward to seeing the exciting research this powerful new tool will make possible.